A picture of PolyU-CE polishing pad


The PolyU-CE is a polyurethane based polishing pad filled with fine cerium oxide to ensure high stock removal, excellent flatness and enhanced surface finish.
The PolyU-CE pad is intended for polishing with cerium-based slurries on a wide range of materials.


  • Polyurethane

  • Thickness: 1.25 mm
  • Hardness as is: 90° Shore A
  • Density: 0.58 g/cm³
  • Compressibility: 1-4%

Available with PSA adhesives HS and EB or OviO magnetic backing.

Product details

Shelf life: 24 months from production date.

Packaging: Our polishing pads are packaged in sealed bags of 10 to ensure that they remain clean during transportation. The bags are packaged in boxes to ensure that the pads remain laying flat in order to prevent creasing of the backing or delamination of the liner before usage.

Backings: Our polishing pads are available with PSA adhesives HS and EB or OviO magnetic backing. For more information about our backings see next tab.


Polishing of:

  • Silicon
  • Silicon oxide
  • Silicon carbide
  • Quartz
  • BK7
  • Fused silica
  • Glass (soda-lime)
  • Glass ceramics
  • Gorilla
  • Borofloat
  • Borosilicate
  • Zerodur
  • Aluminosilicate
  • Zinc sulfide
  • Optical components
  • Crystals
  • Aluminum oxide
  • Silicon carbide
  • Sintered carbides
  • Aluminum nitride
  • Cobalt chrome
  • Quarts
  • Lithium tantalate
  • Lithium niobate
Final polishing of:

  • Fibre optic


Our HS adhesive has a special polymer-based adhesive at on the laminating side and an acrylic adhesive on mounting side with a polyester-liner.
The HS provides excellent adhesion to the polishing cloth and excellent dimensional stability. A very strong adhesion to the plate during application, but still easy to remove at the end of the polishing process. A thicker carrier ensures easier mounting of thin cloths.
NGL Polishing Technologies have developed HS as a unique adhesive designed to be used with most known slurries in the polishing process. It is resistant towards water, water-glycol mixtures, alcohol, alcohol-glycol mixtures, oil (petroleum distillates), oil in water emulsions, bleach, etc.


Our EB adhesive comes with a rubber-based high tack and peel adhesive at the laminating side, removable acrylic adhesive on mounting side and a siliconized paper-liner. The benefits of the EB adhesive are perfect adhesion with the polishing cloth and very good adhesion to the plate during application.
EB is a strong adhesive designed for mounting on all polishing cloths requiring an excellent lamination. Furthermore, it is resistant to alcohol and water-based slurries.


The flexible foil and magnetic plate of the OviO, eases the removal and alignment of the pad which reduces down-time significantly. The OviO backing makes it possible to re-use your polishing pad until it is worn out, and is without the sharp edges usually found on hard metal-backings. Thus, the OviO magnetic backing increases safety and reduces finger cutting, when mounting the polishing pad.
OviO is intended for use as backing for all of our polishing pads.

Need more information?

Request technical data sheet

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